Preparation and characterization of porous silica xerogel film for low dielectric application

Jung Kyun Hong, Hee Sun Yang, Moon Ho Jo, Hyung-Ho Park, Se Young Choi

Research output: Contribution to journalArticle

81 Citations (Scopus)

Abstract

SiO2 xerogel thin film with a low dielectric constant was successfully prepared by a two-step acid-base catalyst procedure and successive surface modification with trimethylchlorosilane (TMCS). Only 15% porosity could be obtained without surface modification but with surface modification the porosity increased to 50%. These porosity values correspond to measured dielectric constants of 3.95 and 2.45, respectively. The low dielectric constant was revealed to depend mainly on the porous structure of xerogel thin film obtained with surface modification. Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy analyses were carried out to evaluate the effect of surface modification which induces the changes of surface coverage from -OC2H5 and -OH to -CH3. Rutherford backscattering spectrometry analysis gave the porosity of SiO2 xerogel thin film as 47.5%. The porosity estimation using refractive index obtained from Ellipsometry work was 43.2% and agrees well with RBS analysis. The network structure of SiO2 xerogel was also evaluated with scanning electron microscopy and transmission electron microscopy.

Original languageEnglish
Pages (from-to)495-500
Number of pages6
JournalThin Solid Films
Volume308-309
Issue number1-4
DOIs
Publication statusPublished - 1997 Oct 31

Fingerprint

Xerogels
xerogels
Silicon Dioxide
Surface treatment
Porosity
Silica
silicon dioxide
preparation
porosity
Permittivity
Thin films
permittivity
thin films
Ellipsometry
Rutherford backscattering spectroscopy
Spectrometry
Fourier transform infrared spectroscopy
Refractive index
X ray photoelectron spectroscopy
ellipsometry

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Hong, Jung Kyun ; Yang, Hee Sun ; Jo, Moon Ho ; Park, Hyung-Ho ; Choi, Se Young. / Preparation and characterization of porous silica xerogel film for low dielectric application. In: Thin Solid Films. 1997 ; Vol. 308-309, No. 1-4. pp. 495-500.
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Preparation and characterization of porous silica xerogel film for low dielectric application. / Hong, Jung Kyun; Yang, Hee Sun; Jo, Moon Ho; Park, Hyung-Ho; Choi, Se Young.

In: Thin Solid Films, Vol. 308-309, No. 1-4, 31.10.1997, p. 495-500.

Research output: Contribution to journalArticle

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AU - Hong, Jung Kyun

AU - Yang, Hee Sun

AU - Jo, Moon Ho

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AU - Choi, Se Young

PY - 1997/10/31

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