Preparation of periodically arrayed silicon microwires using simple patterning process

Changheon Kim, Sangwoo Lim, Chaehwan Jeong

Research output: Contribution to journalArticlepeer-review


The silicon (Si) microwires were fabricated by microsphere lithography using polystyrene (PS) beads monolayer. The Si wafer tailored into 40×40 mm2 was used as a substrate. The monolayer of 2.0 μm-sized PS beads was formed on substrates through convective assembly method. PS beads on substrates were tailored into smaller sizes by O2 plasma treatment using reactive ion etching (RIE). This controllable re-sizing process gave an opportunity to prepare the wire-array with various radii of Si microwires fabricated by using inductively coupled plasma (ICP)-etching. The convective assembly process was monitored in real-time through an optical microscope with a CCD camera. PS beads and structures of Si microwires were characterized using a scanning electron microscope (SEM) and the optical property was measured by the UV-Vis spectroscopy.

Original languageEnglish
Pages (from-to)8527-8532
Number of pages6
JournalJournal of Nanoscience and Nanotechnology
Issue number11
Publication statusPublished - 2015 Nov 1

Bibliographical note

Publisher Copyright:
Copyright © 2015 American Scientific Publishers All rights reserved Printed in the United States of America.

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics


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