Properties of self-assembled monolayer as an anti-adhesion layer on metallic nano stamper

In the nano replication process, surface quality can be determined by the interfacial phenomena such as the wettability and adhesion force between the metallic stamper and replicated polymeric patterns due to high ratio of surface areas to volume. An experimental method is presented to analyze the temperature dependency on the anti-adhesion property between the stamper and polymer. To analyze the wettability between the stamper and polymer, contact angle of pliable polymer on the metallic stamper was measured at actual molding temperature. To reduce sticking between the stamper and replicated polymeric patterns, SAM (self-assembled monolayer) was applied to the nano replication process as an anti-adhesion layer. Alkanethiol SAM was deposited on nickel surface using solution deposition method. To examine the effectiveness of the SAM deposition on the metallic stamper, contact angle and LFM (Lateral Force Microscopy) were measured.