Pulsed chemical vapor deposition of tungsten (W) thin film as a nucleation layer for W-plug fill of sub-100 nm dynamic random access memory technology

Soo Hyun Kim, Eui Sung Hwang, Tae Su Park, Nohjung Kawk, Seung Ho Pyi, Jun Ki Kim, Hyunchul Sohn

Research output: Contribution to journalConference articlepeer-review

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Chemical Compounds

Engineering & Materials Science