Rapid flash patterning of nanostructures

Hyunsik Yoon; Kyoung Mi Lee; Dahl Young Khang; Hong H. Lee; Se Jin Choi

doi:10.1063/1.1790588

Rapid flash patterning of nanostructures

Hyunsik Yoon, Kyoung Mi Lee, Dahl Young Khang, Hong H. Lee, Se Jin Choi

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

The fabrication of sub-100 nm structures in tens of seconds with an aspect ratio much larger than unity was investigated using rapid flash patterning (RFP) method. The film molds under investigation were replicated from the patterns made on silicon wafers by photolithography or electron-beam lithography. The replica molds were prepared by introduction of master pattern drops of photocurable polyurethane acrylate liquid (MINS). The results show that the MINS mold has a Young's modulus of 0.3 GPa compared to 107 GPa for silicon, which is high enough for fine patterning and low enough for flexibility.

Original language	English
Pages (from-to)	1793-1795
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	10
DOIs	https://doi.org/10.1063/1.1790588
Publication status	Published - 2004 Sept 6

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.1790588

Cite this

@article{c157baba12c943999090b8465fb54314,

title = "Rapid flash patterning of nanostructures",

abstract = "The fabrication of sub-100 nm structures in tens of seconds with an aspect ratio much larger than unity was investigated using rapid flash patterning (RFP) method. The film molds under investigation were replicated from the patterns made on silicon wafers by photolithography or electron-beam lithography. The replica molds were prepared by introduction of master pattern drops of photocurable polyurethane acrylate liquid (MINS). The results show that the MINS mold has a Young's modulus of 0.3 GPa compared to 107 GPa for silicon, which is high enough for fine patterning and low enough for flexibility.",

author = "Hyunsik Yoon and Lee, {Kyoung Mi} and Khang, {Dahl Young} and Lee, {Hong H.} and Choi, {Se Jin}",

year = "2004",

month = sep,

day = "6",

doi = "10.1063/1.1790588",

language = "English",

volume = "85",

pages = "1793--1795",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "10",

}

TY - JOUR

T1 - Rapid flash patterning of nanostructures

AU - Yoon, Hyunsik

AU - Lee, Kyoung Mi

AU - Khang, Dahl Young

AU - Lee, Hong H.

AU - Choi, Se Jin

PY - 2004/9/6

Y1 - 2004/9/6

N2 - The fabrication of sub-100 nm structures in tens of seconds with an aspect ratio much larger than unity was investigated using rapid flash patterning (RFP) method. The film molds under investigation were replicated from the patterns made on silicon wafers by photolithography or electron-beam lithography. The replica molds were prepared by introduction of master pattern drops of photocurable polyurethane acrylate liquid (MINS). The results show that the MINS mold has a Young's modulus of 0.3 GPa compared to 107 GPa for silicon, which is high enough for fine patterning and low enough for flexibility.

AB - The fabrication of sub-100 nm structures in tens of seconds with an aspect ratio much larger than unity was investigated using rapid flash patterning (RFP) method. The film molds under investigation were replicated from the patterns made on silicon wafers by photolithography or electron-beam lithography. The replica molds were prepared by introduction of master pattern drops of photocurable polyurethane acrylate liquid (MINS). The results show that the MINS mold has a Young's modulus of 0.3 GPa compared to 107 GPa for silicon, which is high enough for fine patterning and low enough for flexibility.

UR - http://www.scopus.com/inward/record.url?scp=4944247296&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4944247296&partnerID=8YFLogxK

U2 - 10.1063/1.1790588

DO - 10.1063/1.1790588

M3 - Article

AN - SCOPUS:4944247296

SN - 0003-6951

VL - 85

SP - 1793

EP - 1795

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 10

ER -

Rapid flash patterning of nanostructures

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this