The fabrication of sub-100 nm structures in tens of seconds with an aspect ratio much larger than unity was investigated using rapid flash patterning (RFP) method. The film molds under investigation were replicated from the patterns made on silicon wafers by photolithography or electron-beam lithography. The replica molds were prepared by introduction of master pattern drops of photocurable polyurethane acrylate liquid (MINS). The results show that the MINS mold has a Young's modulus of 0.3 GPa compared to 107 GPa for silicon, which is high enough for fine patterning and low enough for flexibility.
|Number of pages||3|
|Journal||Applied Physics Letters|
|Publication status||Published - 2004 Sept 6|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)