The heteroepitaxially grown yttrium oxide layer by an ionized cluster beam (ICB) on a Si(100) substrate was investigated by Rutherford backscattering spectrometry (RBS)/channeling. The channeling minimum value (Xmin) of the Y2O3 layer on Si(100) is 0.28, and this is the smallest value among those reported. From the channeling polar plots, it is found that Y2O3 film grown on Si(100) oriented with (110) direction and has a double domain structure. The (110) axis of Y2O3 layer is exactly parallel to the (100) axis of the Si substrate. It is also observed that the interface region of Y2O3 film has more crystalline defects than the surface region.
Bibliographical noteFunding Information:
This work was supported in part by the Basic Science Research Institute Program, Ministry of Education, 1997, Project No. BSRI-97-2426, in part by the Korean Science and Engineering Foundation through the Atomic-scale Surface Science Research Center at Yonsei University, and also in part by Basic Researches for the Future (4-2N15960).
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry