Abstract
The degradation of the read stability and write ability of static random-access memory (SRAM) is becoming a critical problem in deep submicrometer technology. To solve this problem, there are many SRAM cell design options such as preferred cells and assist circuits. In addition, extremely thin silicon-on-insulator (ETSOI) with a buried oxide offers an independent back-gate control. In this paper, previously proposed SRAM back-gate-assist circuit schemes are analyzed. From this, we propose a read-preferred SRAM cell with a write-assist circuit using the back-gate ETSOI. The proposed write-assist circuit minimizes the dynamic power overhead and satisfies a sufficient cell sigma in all cells during the read and write operations.
Original language | English |
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Article number | 6248688 |
Pages (from-to) | 2575-2581 |
Number of pages | 7 |
Journal | IEEE Transactions on Electron Devices |
Volume | 59 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2012 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering