Recent advances in display electronics, and micro- and nanophotonics have prompted development of novel nanofabrication technologies that enable production of high-fidelity periodic patterns over a large-area substrate. Scanning beam laser interference lithography (SBLIL) is a high-speed manufacturing process of such high-precision nanogratings; however, the precision of the nanopatterns produced by the SBLIL is negatively affected by several factors, including mechanical and optical phase jitters. Previous studies have focused on pattern production, but little research has been conducted on the error correction. In this paper, we propose a design methodology for comprehensive and real-time control of substrate motion and optical path difference in SBLIL process. We derived equations that relate SBLIL error sources to control inputs, and implemented the control strategy through acousto optical modulation and piezo electric actuation. The develop scheme was applied to the SBLIL process, and validated by presenting improved nano-pattern uniformity.
Bibliographical noteFunding Information:
Manuscript received April 5, 2017; revised August 17, 2017 and March 14, 2018; accepted May 18, 2018. Date of publication May 28, 2018; date of current version August 14, 2018. Recommended by Technical Editor Yanling Tian. This work was supported by the National Research Foundation of Korea (NRF) Grant funded by the Korean Government (MSIP) (No.2015R1A5A1037668). (Minsoo Kim and Changsu Park contributed equally to this work.) (Corresponding authors: Chulmin Joo; Shinill Kang.) M. Kim, C. Park, H. Jang, and C. Joo are with the National Center for Optically-Assisted Mechanical System, School of Mechanical Engineering, Yonsei University, Seoul 03722, South Korea (e-mail: firstname.lastname@example.org; email@example.com; firstname.lastname@example.org).
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All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Computer Science Applications
- Electrical and Electronic Engineering