Recently, considerable progress and many breakthroughs have been achieved in the growth of two-dimensional materials, especially transition metal dichalcogenides (TMDCs), which attract significant attention owing to their unique properties originating from their atomically thin layered structure. Chemical vapor deposition (CVD) has shown great promise to fabricate large-scale and high-quality TMDC films with exceptional electronic and optical properties. However, the scalable growth of high-quality TMDCs by CVD is yet to meet industrial criteria. Therefore, growth mechanisms should be unveiled for a deeper understanding and further improvement of growth methods are required. This review summarizes the recent progress in the growth methods of TMDCs through CVD and other modified approaches to gain insights into the growth of large-scale and high-quality TMDCs.
Bibliographical noteFunding Information:
This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) and the Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea (No. 20173010013340). This work was supported by the National Research Foundation of Korea Grant funded by the Korean Government (Grant No. 2017R1A5A1014862, SRC program: vdWMRC center). This research was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean government (2018M3D1A1058794). A.C. is supported by the Yonsei University Research Fund (Yonsei Frontier Lab.
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All Science Journal Classification (ASJC) codes
- Ceramics and Composites