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Recrystallization and activation of ultra-high-dose phosphorus-implanted silicon using multi-pulse nanosecond laser annealing
Hyunsu Shin, Juhee Lee, Minhyung Lee, Hwa Yeon Ryu, Seran Park, Heungsoo Park, Dae Hong Ko
Research output: Contribution to journal › Article › peer-review
1
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(Scopus)