Reliability study of methods to suppress boron transient enhanced diffusion in high-k/metal gate Si/SiGe channel pMOSFETs

Min Sang Park, Yonghyun Kim, Kyong Taek Lee, Chang Yong Kang, Byoung Gi Min, Jungwoo Oh, Prashant Majhi, Hsing Huang Tseng, Jack C. Lee, Sanjay K. Banerjee, Jeong Soo Lee, Raj Jammy, Yoon Ha Jeong

Research output: Contribution to journalArticle

1 Citation (Scopus)

Fingerprint Dive into the research topics of 'Reliability study of methods to suppress boron transient enhanced diffusion in high-k/metal gate Si/SiGe channel pMOSFETs'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy