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Reliability study of methods to suppress boron transient enhanced diffusion in high-k/metal gate Si/SiGe channel pMOSFETs
Min Sang Park, Yonghyun Kim, Kyong Taek Lee, Chang Yong Kang, Byoung Gi Min, Jungwoo Oh, Prashant Majhi, Hsing Huang Tseng, Jack C. Lee, Sanjay K. Banerjee, Jeong Soo Lee, Raj Jammy, Yoon Ha Jeong
Research output: Contribution to journal › Article
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(Scopus)