The role of direct oxidation by aqueous O 3 and advanced oxidation by OH • in the removal of photoresist was studied by chemical kinetic simulation and experiments of O 3 reactivity and decomposition in homogeneous aqueous solutions. O 3 is the main species responsible for the removal of conventional photoresist in the ozonated water cleaning process, and the timing of initiator addition to ozonated water is important to maintain high O 3 concentration. Simulation using t-butanol implies that maintenance of a high OH • concentration is required to remove highly implanted photoresists that O 3 itself cannot easily remove.
All Science Journal Classification (ASJC) codes
- Environmental Engineering
- Environmental Chemistry