Role of O 3 and OH radicals in ozonated aqueous solution for the photoresist removal of semiconductor fabrication

Sangwoo Lim, Christopher E.D. Chidsey

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The role of direct oxidation by aqueous O 3 and advanced oxidation by OH in the removal of photoresist was studied by chemical kinetic simulation and experiments of O 3 reactivity and decomposition in homogeneous aqueous solutions. O 3 is the main species responsible for the removal of conventional photoresist in the ozonated water cleaning process, and the timing of initiator addition to ozonated water is important to maintain high O 3 concentration. Simulation using t-butanol implies that maintenance of a high OH concentration is required to remove highly implanted photoresists that O 3 itself cannot easily remove.

Original languageEnglish
Pages (from-to)139-146
Number of pages8
JournalOzone: Science and Engineering
Volume27
Issue number2
DOIs
Publication statusPublished - 2005 May 19

All Science Journal Classification (ASJC) codes

  • Environmental Engineering
  • Environmental Chemistry

Fingerprint Dive into the research topics of 'Role of O <sub>3</sub> and OH <sup>•</sup> radicals in ozonated aqueous solution for the photoresist removal of semiconductor fabrication'. Together they form a unique fingerprint.

  • Cite this