Scaling and Variation Predictions for Silicon Fin-Based High Electron Mobility Transistor

Sung Ho Kim, Jong Yul Park, Jiwon Chang, Kyung Rok Kim

Research output: Contribution to journalArticlepeer-review

Abstract

We present scaling and variation predictions for a strained-silicon (s-Si) fin-based high electron mobility transistor (FinHEMT) with well-tempered, short-channel characteristics. Using device simulation calibrated with experimental data, we predict that the FinHEMT can achieve high electron mobility (1100 cm2/Vs) and enhance effective mobility (up to 2x) by suppressing the surface roughness scattering effect in the Si quantum well (QW) channel. Moreover, excellent scalability of the FinHEMT ON-current ( {I}_{{\textit {ON}}} >1.1 mA/ \mu \text{m} at {L}_{G} < 10 nm) is predicted as the high channel mobility can reduce the underlap series resistance in the scaled device. Owing to this low underlap resistivity, geometrical variations of fin width and underlap length have little effect on the ON-current in FinHEMT.

Original languageEnglish
Article number9204733
Pages (from-to)1621-1624
Number of pages4
JournalIEEE Electron Device Letters
Volume41
Issue number11
DOIs
Publication statusPublished - 2020 Nov

Bibliographical note

Funding Information:
Manuscript received August 18, 2020; revised September 11, 2020 and September 17, 2020; accepted September 19, 2020. Date of publication September 23, 2020; date of current version October 23, 2020. This work was supported in part by the National Research Foundation of Korea (NRF) through the Korean Government, Ministry of Education, Science and Technology (MEST) under Grant 2016M3A7B4909943, Grant 2019R1A2C2010619, and Grant 2019M3F3A1A01074453; in part by Samsung Electronics; and in part by the U.K. Brand Research Fund of the Ulsan National Institute of Science and Technology (UNIST) under Grant 1.200033.01. The review of this letter was arranged by Editor K. J. Kuhn. (Corresponding authors: Jiwon Chang; Kyung Rok Kim.) The authors are with the Department of Electrical Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, South Korea (e-mail: jiwon.chang@unist.ac.kr; krkim@unist.ac.kr).

Publisher Copyright:
© 1980-2012 IEEE.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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