Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

Doyoung Kim, Jaehong Yoon, Hyungjun Kim

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

ZnO nanodots were prepared by selective area atomic layer deposition (SA-ALD) on an octadecyltrichlorosilane (ODTS) self-assembly monolayers (SAMs) patterns formed using a diblock co-polymer (DBC) nanotemplate. In order to transfer well-ordered nanaotemplate in SAMs, SiO 2 sacrificial layer was inserted between DBC and SAMs. Cylindrical nanoholes under 16 nm diameters were wellformed on SiO 2 layer. SA-ALD of ZnO was successfully performed on by ODTS SAMs.

Original languageEnglish
Pages (from-to)1483-1486
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Volume12
Issue number2
DOIs
Publication statusPublished - 2012

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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