Selective growth of vertical zno nanowires with the control of hydrothermal synthesis and nano-lmprint technology

Jaejin Song, Seonghoon Baek, Heon Lee, Sangwoo Lim

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Nano-imprint technology is one of the most advanced technologies for the fabrication of nano-size patterning. In this study, nano-imprint technology was used for the selective growth of ZnO nanowires on the Si wafer. When the poly methyl-methacrylate (PMMA) was first patterned by a nano-imprint process and ZnO seed layer was deposited and patterned by lift-off, ZnO nanowires were not vertically grown on the whole area of the patterned seed layer. Synthesis in zinc sulfate solution exhibited well-structured ZnO nanowires compared to the zinc nitrate solution, but uniformly aligned vertical growth of ZnO nanowires was not observed in either cases. On the other hand, when the PMMA was patterned using a nano-imprint process in the presence of seed layer, and ZnO nanowires were synthesized in zinc sulfate solution, selective growth of vertically aligned ZnO nanowires on 0.5 yam pattern sizes was achieved. The observation in this study suggests that the selective growth of ZnO nanowires on a defined pattern size can be obtained with the modification of pattering sequence and the control of low temperature hydrothermal synthesis of ZnO nanowires.

Original languageEnglish
Pages (from-to)3909-3913
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume9
Issue number6
DOIs
Publication statusPublished - 2009 Jun 1

Fingerprint

Nanowires
Hydrothermal synthesis
nanotechnology
Nanotechnology
nanowires
Technology
synthesis
Growth
Zinc Sulfate
Seed
seeds
Seeds
Zinc
zinc
Polymethyl Methacrylate
Polymethyl methacrylates
polymethyl methacrylate
sulfates
Dioscorea
nitrates

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Chemistry(all)
  • Materials Science(all)
  • Bioengineering
  • Biomedical Engineering

Cite this

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title = "Selective growth of vertical zno nanowires with the control of hydrothermal synthesis and nano-lmprint technology",
abstract = "Nano-imprint technology is one of the most advanced technologies for the fabrication of nano-size patterning. In this study, nano-imprint technology was used for the selective growth of ZnO nanowires on the Si wafer. When the poly methyl-methacrylate (PMMA) was first patterned by a nano-imprint process and ZnO seed layer was deposited and patterned by lift-off, ZnO nanowires were not vertically grown on the whole area of the patterned seed layer. Synthesis in zinc sulfate solution exhibited well-structured ZnO nanowires compared to the zinc nitrate solution, but uniformly aligned vertical growth of ZnO nanowires was not observed in either cases. On the other hand, when the PMMA was patterned using a nano-imprint process in the presence of seed layer, and ZnO nanowires were synthesized in zinc sulfate solution, selective growth of vertically aligned ZnO nanowires on 0.5 yam pattern sizes was achieved. The observation in this study suggests that the selective growth of ZnO nanowires on a defined pattern size can be obtained with the modification of pattering sequence and the control of low temperature hydrothermal synthesis of ZnO nanowires.",
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Selective growth of vertical zno nanowires with the control of hydrothermal synthesis and nano-lmprint technology. / Song, Jaejin; Baek, Seonghoon; Lee, Heon; Lim, Sangwoo.

In: Journal of Nanoscience and Nanotechnology, Vol. 9, No. 6, 01.06.2009, p. 3909-3913.

Research output: Contribution to journalArticle

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