Selective phase modulation of NiSi using N-ion implantation for high performance dopant-segregated source/drain n-channel MOSFETs

W. Y. Loh, P. Y. Hung, B. E. Coss, P. Kalra, Injo Ok, Greg Smith, C. Y. Kang, S. H. Lee, J. Oh, B. Sassman, P. Majhi, P. Kirsch, H. H. Tseng, R. Jammy

Research output: Chapter in Book/Report/Conference proceedingConference contribution

13 Citations (Scopus)

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Engineering & Materials Science