Self-alignment of SiO2 colloidal particles on physically and/or chemically patterned surfaces

Changdeuck Bae, Hyunjung Shin, Jooho Moon

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

We report effects of patterned surface structures with the modulation of hydrophobicity in the fabrication of two-dimensional (2D) self-aligned colloidal crystals. Colloidal silica particles have been synthesized by the Stöber process (near monodispersion of 280 nm and 350 nm in diameter). When a drop of the silica suspension with a given volume and concentration (typically 5 μL and 0.5 wt % of the silica particles) is placed upon the substrate, it spreads and forms a concave shape in geometric confinement. In the drop of suspension, horizontal convective flow occurs due to the concave shape and capillary forces. Silica particles are packed together hexagonally resulting in a self-aligned silica monolayer inside the patterned lines. The surfaces with chemical and/or physical patterned lines (∼3 and 5 μm in width and spacing) were fabricated on silicon substrate with silicon dioxide by photolithography combined with the modified chemically through SAMs (self-assembled monolayers) of OTS (octadecyltrichlorosilane) using a microcontact printing technique to create alternating hydrophilic/hydrophobic line patterns. Highly ordered silica 2D patterns were observed in the hydrophilic regions, while no silica particles were found in OTS-covered line patterns. Self-aligned silica particle patterns were also observed in a quite large area (at least several hundreds of micrometers) through the line patterns of the surfaces with superhydrophilic modification. This method can serve as a position selective self-alignment aggregation and can be applicable to photonics and micro/nanofabrication.

Original languageEnglish
Pages (from-to)103-111
Number of pages9
JournalCeramic Transactions
Volume159
Publication statusPublished - 2005 Aug 22
Event106th Annual Meeting of the American Ceramic Society - Indianapolis, IN, United States
Duration: 2004 Apr 182004 Apr 21

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Silicon Dioxide
Silica
Suspensions
Self assembled monolayers
Photolithography
Silicon
Substrates
Hydrophobicity
Nanotechnology
Surface structure
Photonics
Printing
Monolayers
Agglomeration
Modulation
Fabrication
Crystals

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

Cite this

@article{fccb0e14776240c6a61b06ff10f47e4c,
title = "Self-alignment of SiO2 colloidal particles on physically and/or chemically patterned surfaces",
abstract = "We report effects of patterned surface structures with the modulation of hydrophobicity in the fabrication of two-dimensional (2D) self-aligned colloidal crystals. Colloidal silica particles have been synthesized by the St{\"o}ber process (near monodispersion of 280 nm and 350 nm in diameter). When a drop of the silica suspension with a given volume and concentration (typically 5 μL and 0.5 wt {\%} of the silica particles) is placed upon the substrate, it spreads and forms a concave shape in geometric confinement. In the drop of suspension, horizontal convective flow occurs due to the concave shape and capillary forces. Silica particles are packed together hexagonally resulting in a self-aligned silica monolayer inside the patterned lines. The surfaces with chemical and/or physical patterned lines (∼3 and 5 μm in width and spacing) were fabricated on silicon substrate with silicon dioxide by photolithography combined with the modified chemically through SAMs (self-assembled monolayers) of OTS (octadecyltrichlorosilane) using a microcontact printing technique to create alternating hydrophilic/hydrophobic line patterns. Highly ordered silica 2D patterns were observed in the hydrophilic regions, while no silica particles were found in OTS-covered line patterns. Self-aligned silica particle patterns were also observed in a quite large area (at least several hundreds of micrometers) through the line patterns of the surfaces with superhydrophilic modification. This method can serve as a position selective self-alignment aggregation and can be applicable to photonics and micro/nanofabrication.",
author = "Changdeuck Bae and Hyunjung Shin and Jooho Moon",
year = "2005",
month = "8",
day = "22",
language = "English",
volume = "159",
pages = "103--111",
journal = "Ceramic Transactions",
issn = "1042-1122",
publisher = "American Ceramic Society",

}

Self-alignment of SiO2 colloidal particles on physically and/or chemically patterned surfaces. / Bae, Changdeuck; Shin, Hyunjung; Moon, Jooho.

In: Ceramic Transactions, Vol. 159, 22.08.2005, p. 103-111.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Self-alignment of SiO2 colloidal particles on physically and/or chemically patterned surfaces

AU - Bae, Changdeuck

AU - Shin, Hyunjung

AU - Moon, Jooho

PY - 2005/8/22

Y1 - 2005/8/22

N2 - We report effects of patterned surface structures with the modulation of hydrophobicity in the fabrication of two-dimensional (2D) self-aligned colloidal crystals. Colloidal silica particles have been synthesized by the Stöber process (near monodispersion of 280 nm and 350 nm in diameter). When a drop of the silica suspension with a given volume and concentration (typically 5 μL and 0.5 wt % of the silica particles) is placed upon the substrate, it spreads and forms a concave shape in geometric confinement. In the drop of suspension, horizontal convective flow occurs due to the concave shape and capillary forces. Silica particles are packed together hexagonally resulting in a self-aligned silica monolayer inside the patterned lines. The surfaces with chemical and/or physical patterned lines (∼3 and 5 μm in width and spacing) were fabricated on silicon substrate with silicon dioxide by photolithography combined with the modified chemically through SAMs (self-assembled monolayers) of OTS (octadecyltrichlorosilane) using a microcontact printing technique to create alternating hydrophilic/hydrophobic line patterns. Highly ordered silica 2D patterns were observed in the hydrophilic regions, while no silica particles were found in OTS-covered line patterns. Self-aligned silica particle patterns were also observed in a quite large area (at least several hundreds of micrometers) through the line patterns of the surfaces with superhydrophilic modification. This method can serve as a position selective self-alignment aggregation and can be applicable to photonics and micro/nanofabrication.

AB - We report effects of patterned surface structures with the modulation of hydrophobicity in the fabrication of two-dimensional (2D) self-aligned colloidal crystals. Colloidal silica particles have been synthesized by the Stöber process (near monodispersion of 280 nm and 350 nm in diameter). When a drop of the silica suspension with a given volume and concentration (typically 5 μL and 0.5 wt % of the silica particles) is placed upon the substrate, it spreads and forms a concave shape in geometric confinement. In the drop of suspension, horizontal convective flow occurs due to the concave shape and capillary forces. Silica particles are packed together hexagonally resulting in a self-aligned silica monolayer inside the patterned lines. The surfaces with chemical and/or physical patterned lines (∼3 and 5 μm in width and spacing) were fabricated on silicon substrate with silicon dioxide by photolithography combined with the modified chemically through SAMs (self-assembled monolayers) of OTS (octadecyltrichlorosilane) using a microcontact printing technique to create alternating hydrophilic/hydrophobic line patterns. Highly ordered silica 2D patterns were observed in the hydrophilic regions, while no silica particles were found in OTS-covered line patterns. Self-aligned silica particle patterns were also observed in a quite large area (at least several hundreds of micrometers) through the line patterns of the surfaces with superhydrophilic modification. This method can serve as a position selective self-alignment aggregation and can be applicable to photonics and micro/nanofabrication.

UR - http://www.scopus.com/inward/record.url?scp=23744442355&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=23744442355&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:23744442355

VL - 159

SP - 103

EP - 111

JO - Ceramic Transactions

JF - Ceramic Transactions

SN - 1042-1122

ER -