Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films

Kyujung Kim, Eun Jin Cho, Yong Min Huh, Donghyun Kim

Research output: Contribution to conferencePaper

Abstract

The evanescent field enhancement was investigated experimentally based on dielectric thin films in total internal reflection microscopy. The sample employed Al2O3 and SiO2 layers deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent microbeads relative to that of a control sample without dielectric films was polarization dependent and was in good agreement with numerical results. The thin-film-based sensitivity enhancement was also qualitatively confirmed in live-cell imaging of quantum dots.

Original languageEnglish
PagesBMD65
Publication statusPublished - 2008 Dec 1
EventBiomedical Optics, BIOMED 2008 - St. Petersburg, FL, United States
Duration: 2008 Mar 162008 Mar 19

Other

OtherBiomedical Optics, BIOMED 2008
CountryUnited States
CitySt. Petersburg, FL
Period08/3/1608/3/19

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All Science Journal Classification (ASJC) codes

  • Biomedical Engineering
  • Biomaterials
  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this

Kim, K., Cho, E. J., Huh, Y. M., & Kim, D. (2008). Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films. BMD65. Paper presented at Biomedical Optics, BIOMED 2008, St. Petersburg, FL, United States.