Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films

Kyujung Kim, Eun Jin Cho, yongmin Huh, Donghyun Kim

Research output: Contribution to conferencePaper

Abstract

The evanescent field enhancement was investigated experimentally based on dielectric thin films in total internal reflection microscopy. The sample employed Al2O3 and SiO2 layers deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent microbeads relative to that of a control sample without dielectric films was polarization dependent and was in good agreement with numerical results. The thin-film-based sensitivity enhancement was also qualitatively confirmed in live-cell imaging of quantum dots.

Original languageEnglish
Publication statusPublished - 2008 Dec 1
EventBiomedical Optics, BIOMED 2008 - St. Petersburg, FL, United States
Duration: 2008 Mar 162008 Mar 19

Other

OtherBiomedical Optics, BIOMED 2008
CountryUnited States
CitySt. Petersburg, FL
Period08/3/1608/3/19

Fingerprint

Dielectric films
Fluorescence
Evanescent fields
Imaging techniques
Thin films
fluorescence
augmentation
sensitivity
thin films
Semiconductor quantum dots
Microscopic examination
Polarization
Glass
Substrates
quantum dots
microscopy
glass
polarization
cells

All Science Journal Classification (ASJC) codes

  • Biomedical Engineering
  • Biomaterials
  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this

Kim, K., Cho, E. J., Huh, Y., & Kim, D. (2008). Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films. Paper presented at Biomedical Optics, BIOMED 2008, St. Petersburg, FL, United States.
Kim, Kyujung ; Cho, Eun Jin ; Huh, yongmin ; Kim, Donghyun. / Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films. Paper presented at Biomedical Optics, BIOMED 2008, St. Petersburg, FL, United States.
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Kim, K, Cho, EJ, Huh, Y & Kim, D 2008, 'Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films' Paper presented at Biomedical Optics, BIOMED 2008, St. Petersburg, FL, United States, 08/3/16 - 08/3/19, .

Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films. / Kim, Kyujung; Cho, Eun Jin; Huh, yongmin; Kim, Donghyun.

2008. Paper presented at Biomedical Optics, BIOMED 2008, St. Petersburg, FL, United States.

Research output: Contribution to conferencePaper

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T1 - Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films

AU - Kim, Kyujung

AU - Cho, Eun Jin

AU - Huh, yongmin

AU - Kim, Donghyun

PY - 2008/12/1

Y1 - 2008/12/1

N2 - The evanescent field enhancement was investigated experimentally based on dielectric thin films in total internal reflection microscopy. The sample employed Al2O3 and SiO2 layers deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent microbeads relative to that of a control sample without dielectric films was polarization dependent and was in good agreement with numerical results. The thin-film-based sensitivity enhancement was also qualitatively confirmed in live-cell imaging of quantum dots.

AB - The evanescent field enhancement was investigated experimentally based on dielectric thin films in total internal reflection microscopy. The sample employed Al2O3 and SiO2 layers deposited on an SF10 glass substrate. Field intensity enhancement measured by fluorescent microbeads relative to that of a control sample without dielectric films was polarization dependent and was in good agreement with numerical results. The thin-film-based sensitivity enhancement was also qualitatively confirmed in live-cell imaging of quantum dots.

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M3 - Paper

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Kim K, Cho EJ, Huh Y, Kim D. Sensitivity enhancement for total internal reflection fluorescence imaging using dielectric thin films. 2008. Paper presented at Biomedical Optics, BIOMED 2008, St. Petersburg, FL, United States.