Zr-Si thin films were deposited on copper substrates by co-sputtering method of two pure targets. The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The composition was measured by Rutherford backscattering spectroscopy (RBS) and energy-dispersive X-ray spectroscopy (EDS). The electrochemical results showed that alloying with Zr improves the cycling performance, while as a result the reversible capacity decreases. It appears that the electrochemical cycling performance can be further improved by controlling the film deposition conditions such as substrate temperature and bias sputtering.
|Number of pages||4|
|Journal||Journal of Power Sources|
|Publication status||Published - 2003 Jun 1|
|Event||Selected Papers Presented at the 11th IMLB - Monterey, CA, United States|
Duration: 2002 Jun 22 → 2002 Jun 28
Bibliographical noteFunding Information:
This work was supported by the Korean Ministry of Science and Technology through the research program for “National Research Laboratory”.
All Science Journal Classification (ASJC) codes
- Renewable Energy, Sustainability and the Environment
- Energy Engineering and Power Technology
- Physical and Theoretical Chemistry
- Electrical and Electronic Engineering