Abstract
Zr-Si thin films were deposited on copper substrates by co-sputtering method of two pure targets. The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM). The composition was measured by Rutherford backscattering spectroscopy (RBS) and energy-dispersive X-ray spectroscopy (EDS). The electrochemical results showed that alloying with Zr improves the cycling performance, while as a result the reversible capacity decreases. It appears that the electrochemical cycling performance can be further improved by controlling the film deposition conditions such as substrate temperature and bias sputtering.
| Original language | English |
|---|---|
| Pages (from-to) | 113-116 |
| Number of pages | 4 |
| Journal | Journal of Power Sources |
| Volume | 119-121 |
| DOIs | |
| Publication status | Published - 2003 Jun 1 |
| Event | Selected Papers Presented at the 11th IMLB - Monterey, CA, United States Duration: 2002 Jun 22 → 2002 Jun 28 |
Bibliographical note
Funding Information:This work was supported by the Korean Ministry of Science and Technology through the research program for “National Research Laboratory”.
All Science Journal Classification (ASJC) codes
- Renewable Energy, Sustainability and the Environment
- Energy Engineering and Power Technology
- Physical and Theoretical Chemistry
- Electrical and Electronic Engineering
