Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

Sang Kyun Kim, Hyeon Mo Cho, Sang Ran Koh, Mi Young Kim, Hui Chan Yoon, Yong Jin Chung, Jong Seob Kim, Tuwon Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

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