Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Hyukmin Kweon; Keun Yeong Choi; Han Wool Park; Ryungyu Lee; Ukjin Jeong; Min Jung Kim; Hyunmin Hong; Borina Ha; Sein Lee; Jang Yeon Kwon; Kwun Bum Chung; Moon Sung Kang; Hojin Lee; Do Hwan Kim

doi:10.1038/s41467-022-34531-y

Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Hyukmin Kweon, Keun Yeong Choi, Han Wool Park, Ryungyu Lee, Ukjin Jeong, Min Jung Kim, Hyunmin Hong, Borina Ha, Sein Lee, Jang Yeon Kwon, Kwun Bum Chung, Moon Sung Kang, Hojin Lee, Do Hwan Kim

School of Integrated Technology

Research output: Contribution to journal › Article › peer-review

Abstract

Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of organic light-emitting diodes (OLEDs) from mobile and TV displays into near-to-eye microdisplays. However, current patterning techniques so far suffer from low resolution, consecutive pattern for RGB pixelation, low pattern fidelity, and throughput issue. Here, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch-blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (up to 4500 pixels per inch) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into ultrahigh-density OLED microdisplays.

Original language	English
Article number	6775
Journal	Nature communications
Volume	13
Issue number	1
DOIs	https://doi.org/10.1038/s41467-022-34531-y
Publication status	Published - 2022 Dec

Bibliographical note

Funding Information:
This work was supported by National R&D Program through the National Research Foundation of Korea (NRF), funded by the Ministry of Science and ICT (2021M3D1A2049315). This work was also supported by the Basic Science Research Program of the National Research Foundation of Korea (NRF), funded by the Ministry of Science and ICT (2020R1A2C3014237).

Publisher Copyright:
© 2022, The Author(s).

All Science Journal Classification (ASJC) codes

Chemistry(all)
Biochemistry, Genetics and Molecular Biology(all)
General
Physics and Astronomy(all)

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10.1038/s41467-022-34531-y

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title = "Silicone engineered anisotropic lithography for ultrahigh-density OLEDs",

abstract = "Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of organic light-emitting diodes (OLEDs) from mobile and TV displays into near-to-eye microdisplays. However, current patterning techniques so far suffer from low resolution, consecutive pattern for RGB pixelation, low pattern fidelity, and throughput issue. Here, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch-blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (up to 4500 pixels per inch) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into ultrahigh-density OLED microdisplays.",

author = "Hyukmin Kweon and Choi, {Keun Yeong} and Park, {Han Wool} and Ryungyu Lee and Ukjin Jeong and Kim, {Min Jung} and Hyunmin Hong and Borina Ha and Sein Lee and Kwon, {Jang Yeon} and Chung, {Kwun Bum} and Kang, {Moon Sung} and Hojin Lee and Kim, {Do Hwan}",

note = "Funding Information: This work was supported by National R&D Program through the National Research Foundation of Korea (NRF), funded by the Ministry of Science and ICT (2021M3D1A2049315). This work was also supported by the Basic Science Research Program of the National Research Foundation of Korea (NRF), funded by the Ministry of Science and ICT (2020R1A2C3014237). Publisher Copyright: {\textcopyright} 2022, The Author(s).",

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AU - Kweon, Hyukmin

AU - Choi, Keun Yeong

AU - Park, Han Wool

AU - Lee, Ryungyu

AU - Jeong, Ukjin

AU - Kim, Min Jung

AU - Hong, Hyunmin

AU - Ha, Borina

AU - Lee, Sein

AU - Kwon, Jang Yeon

AU - Chung, Kwun Bum

AU - Kang, Moon Sung

AU - Lee, Hojin

AU - Kim, Do Hwan

N1 - Funding Information: This work was supported by National R&D Program through the National Research Foundation of Korea (NRF), funded by the Ministry of Science and ICT (2021M3D1A2049315). This work was also supported by the Basic Science Research Program of the National Research Foundation of Korea (NRF), funded by the Ministry of Science and ICT (2020R1A2C3014237). Publisher Copyright: © 2022, The Author(s).

PY - 2022/12

Y1 - 2022/12

N2 - Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of organic light-emitting diodes (OLEDs) from mobile and TV displays into near-to-eye microdisplays. However, current patterning techniques so far suffer from low resolution, consecutive pattern for RGB pixelation, low pattern fidelity, and throughput issue. Here, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch-blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (up to 4500 pixels per inch) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into ultrahigh-density OLED microdisplays.

AB - Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of organic light-emitting diodes (OLEDs) from mobile and TV displays into near-to-eye microdisplays. However, current patterning techniques so far suffer from low resolution, consecutive pattern for RGB pixelation, low pattern fidelity, and throughput issue. Here, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch-blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (up to 4500 pixels per inch) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into ultrahigh-density OLED microdisplays.

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Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Abstract

Bibliographical note

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