Simple and cost-effective fabrication of size-tunable zinc oxide architectures by multiple size reduction technique

Hyeong Ho Park, Xin Zhang, Seon Yong Hwang, Sang Hyun Jung, Semin Kang, Hyun Beom Shin, Ho Kwan Kang, Hyung Ho Park, Ross H. Hill, Chul Ki Ko

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We present a simple size reduction technique for fabricating 400 nm zinc oxide (ZnO) architectures using a silicon master containing only microscale architectures. In this approach, the overall fabrication, from the master to the molds and the final ZnO architectures, features cost-effective UV photolithography, instead of electron beam lithography or deep-UV photolithography. A photosensitive Zn-containing sol-gel precursor was used to imprint architectures by direct UV-assisted nanoimprint lithography (UV-NIL). The resulting Zn-containing architectures were then converted to ZnO architectures with reduced feature sizes by thermal annealing at 400 °C for 1 h. The imprinted and annealed ZnO architectures were also used as new masters for the size reduction technique. ZnO pillars of 400 nm diameter were obtained from a silicon master with pillars of 1000 nm diameter by simply repeating the size reduction technique. The photosensitivity and contrast of the Zn-containing precursor were measured as 6.5 J cm -2 and 16.5, respectively. Interesting complex ZnO patterns, with both microscale pillars and nanoscale holes, were demonstrated by the combination of dose-controlled UV exposure and a two-step UV-NIL.

Original languageEnglish
Article number025003
JournalScience and Technology of Advanced Materials
Issue number2
Publication statusPublished - 2012 Apr 1


All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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