Simple patterning techniques for fabrication of organic thin film transistors

Jin Jo Sung, Jin Kim Woo, Su Kim Chang, Hong Koo Baik

Research output: Contribution to journalConference article

Abstract

The influence of oxygen plasma and octadecyltricnlorosilane (OTS) treatment of SiO2 on the patterning of poly(3,4-ethylenedioxythiophene)/ poly(4-styrenesulfonate) (PEDOT:PSS) is presented. A significart difference in surface energies between plasma treated and OTS treated SiO2 was noted Such heterogeneous surface energy guides PEDOT:PSS to wet and spread on the wettable region and to dewet and refract from other regions.

Original languageEnglish
Pages (from-to)1273-1275
Number of pages3
JournalProceedings of International Meeting on Information Display
Volume2
Publication statusPublished - 2006 Dec 1

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Thin film transistors
Interfacial energy
Plasmas
Fabrication
Oxygen

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

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abstract = "The influence of oxygen plasma and octadecyltricnlorosilane (OTS) treatment of SiO2 on the patterning of poly(3,4-ethylenedioxythiophene)/ poly(4-styrenesulfonate) (PEDOT:PSS) is presented. A significart difference in surface energies between plasma treated and OTS treated SiO2 was noted Such heterogeneous surface energy guides PEDOT:PSS to wet and spread on the wettable region and to dewet and refract from other regions.",
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Simple patterning techniques for fabrication of organic thin film transistors. / Sung, Jin Jo; Woo, Jin Kim; Chang, Su Kim; Baik, Hong Koo.

In: Proceedings of International Meeting on Information Display, Vol. 2, 01.12.2006, p. 1273-1275.

Research output: Contribution to journalConference article

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T1 - Simple patterning techniques for fabrication of organic thin film transistors

AU - Sung, Jin Jo

AU - Woo, Jin Kim

AU - Chang, Su Kim

AU - Baik, Hong Koo

PY - 2006/12/1

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N2 - The influence of oxygen plasma and octadecyltricnlorosilane (OTS) treatment of SiO2 on the patterning of poly(3,4-ethylenedioxythiophene)/ poly(4-styrenesulfonate) (PEDOT:PSS) is presented. A significart difference in surface energies between plasma treated and OTS treated SiO2 was noted Such heterogeneous surface energy guides PEDOT:PSS to wet and spread on the wettable region and to dewet and refract from other regions.

AB - The influence of oxygen plasma and octadecyltricnlorosilane (OTS) treatment of SiO2 on the patterning of poly(3,4-ethylenedioxythiophene)/ poly(4-styrenesulfonate) (PEDOT:PSS) is presented. A significart difference in surface energies between plasma treated and OTS treated SiO2 was noted Such heterogeneous surface energy guides PEDOT:PSS to wet and spread on the wettable region and to dewet and refract from other regions.

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