Single-step photopatterning of diffraction gratings in highly photosensitive hybrid sol-gel films

Dong Jun Kang; Jang Ung Park; Byeong Soo Bae; Junji Nishii; Kenji Kintaka

doi:10.1364/OE.11.001144

Single-step photopatterning of diffraction gratings in highly photosensitive hybrid sol-gel films

Dong Jun Kang, Jang Ung Park, Byeong Soo Bae, Junji Nishii, Kenji Kintaka

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Inorganic-organic hybrid materials prepared by a sol-gel process showed a large photoinduced negative refractive-index change (2×10^-2) and a volume change. Diffraction gratings were made directly by irradiation with a KrF excimer laser (248 nm) through a phase mask without any etching process. The dependence of diffraction efficiency on irradiation conditions was investigated. The maximum diffraction efficiency, measured by the Littrow configuration with a He-Ne laser (633 nm), was 3.4% in reflection mode.

Original language	English
Pages (from-to)	1144-1148
Number of pages	5
Journal	Optics Express
Volume	11
Issue number	10
DOIs	https://doi.org/10.1364/OE.11.001144
Publication status	Published - 2003 May

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics

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abstract = "Inorganic-organic hybrid materials prepared by a sol-gel process showed a large photoinduced negative refractive-index change (2×10-2) and a volume change. Diffraction gratings were made directly by irradiation with a KrF excimer laser (248 nm) through a phase mask without any etching process. The dependence of diffraction efficiency on irradiation conditions was investigated. The maximum diffraction efficiency, measured by the Littrow configuration with a He-Ne laser (633 nm), was 3.4% in reflection mode.",

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AU - Nishii, Junji

AU - Kintaka, Kenji

PY - 2003/5

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AB - Inorganic-organic hybrid materials prepared by a sol-gel process showed a large photoinduced negative refractive-index change (2×10-2) and a volume change. Diffraction gratings were made directly by irradiation with a KrF excimer laser (248 nm) through a phase mask without any etching process. The dependence of diffraction efficiency on irradiation conditions was investigated. The maximum diffraction efficiency, measured by the Littrow configuration with a He-Ne laser (633 nm), was 3.4% in reflection mode.

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Single-step photopatterning of diffraction gratings in highly photosensitive hybrid sol-gel films

Abstract

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