Solid-state thin-film supercapacitor with ruthenium oxide and solid electrolyte thin films

Y. S. Yoon, W. I. Cho, J. H. Lim, Doo Jin Choi

Research output: Contribution to journalArticle

104 Citations (Scopus)

Abstract

Direct current reactive sputtering deposition of ruthenium oxide thin films (bottom and top electrodes) at 400°C are performed to produce a solid-state thin-film supercapacitor (TFSC). The supercapacitor has a cell structure of RuO2/Li2.94PO2.37N0.75 (Lipon)/RuO2/Pt. Radio frequency, reactive sputtering deposition of an Li2.94PO2.37N0.75 electrolyte film is performed on the bottom RuO2 film at room temperature to separate the bottom and top RuO2 electrodes electrically. The stoichiometry of the RuO2 thin film is investigated by Rutherford back-scattering spectrometry (RBS). X-ray diffraction (XRD) shows that the as-deposited RuO2 thin film is an amorphous phase. Scanning electron microscopy (SEM) measurements reveal that the RuO2/Lipon/RuO2 hetero-interfaces have no inter-diffusion problems. Charge-discharge measurements with constant current at roo m temperature clearly reveal typical supercapacitor behaviour for a RuO2/Lipon/RuO2/Pt cell structure. Since the electrolyte thin film has low ionic mobility, the capacity and cycle performance are inferior to those of a bulk type of supercapacitor. These results indicate that a high performance, TFSC can be fabricated by a solid electrolyte thin film with high ionic conductivity.

Original languageEnglish
Pages (from-to)126-129
Number of pages4
JournalJournal of Power Sources
Volume101
Issue number1
DOIs
Publication statusPublished - 2001 Oct 1

Fingerprint

Ruthenium
Solid electrolytes
electrochemical capacitors
solid electrolytes
Oxides
ruthenium
electrolytes
solid state
Thin films
oxides
thin films
Reactive sputtering
Electrolytes
sputtering
ionic mobility
Electrodes
electrodes
Ionic conductivity
Supercapacitor
cells

All Science Journal Classification (ASJC) codes

  • Renewable Energy, Sustainability and the Environment
  • Energy Engineering and Power Technology
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering

Cite this

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abstract = "Direct current reactive sputtering deposition of ruthenium oxide thin films (bottom and top electrodes) at 400°C are performed to produce a solid-state thin-film supercapacitor (TFSC). The supercapacitor has a cell structure of RuO2/Li2.94PO2.37N0.75 (Lipon)/RuO2/Pt. Radio frequency, reactive sputtering deposition of an Li2.94PO2.37N0.75 electrolyte film is performed on the bottom RuO2 film at room temperature to separate the bottom and top RuO2 electrodes electrically. The stoichiometry of the RuO2 thin film is investigated by Rutherford back-scattering spectrometry (RBS). X-ray diffraction (XRD) shows that the as-deposited RuO2 thin film is an amorphous phase. Scanning electron microscopy (SEM) measurements reveal that the RuO2/Lipon/RuO2 hetero-interfaces have no inter-diffusion problems. Charge-discharge measurements with constant current at roo m temperature clearly reveal typical supercapacitor behaviour for a RuO2/Lipon/RuO2/Pt cell structure. Since the electrolyte thin film has low ionic mobility, the capacity and cycle performance are inferior to those of a bulk type of supercapacitor. These results indicate that a high performance, TFSC can be fabricated by a solid electrolyte thin film with high ionic conductivity.",
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Solid-state thin-film supercapacitor with ruthenium oxide and solid electrolyte thin films. / Yoon, Y. S.; Cho, W. I.; Lim, J. H.; Choi, Doo Jin.

In: Journal of Power Sources, Vol. 101, No. 1, 01.10.2001, p. 126-129.

Research output: Contribution to journalArticle

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