Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasma

Changhoon Oh, Hoonchul Ryoo, Hyungwoo Lee, Se Yeon Kim, Hun Jung Yi, Jae W. Hahn

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We proposed a spatially resolved optical emission spectrometer (SROES) for analyzing the uniformity of plasma density for semiconductor processes. To enhance the spatial resolution of the SROES, we constructed a SROES system using a series of lenses, apertures, and pinholes. We calculated the spatial resolution of the SROES for the variation of pinhole size, and our calculated results were in good agreement with the measured spatial variation of the constructed SROES. The performance of the SROES was also verified by detecting the correlation between the distribution of a fluorine radical in inductively coupled plasma etch process and the etch rate of a SiO2 film on a silicon wafer.

Original languageEnglish
Article number103109
JournalReview of Scientific Instruments
Volume81
Issue number10
DOIs
Publication statusPublished - 2010 Oct 1

All Science Journal Classification (ASJC) codes

  • Instrumentation

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