As the semiconductor technology scales down, the read stability and write ability of a static random-access memory (SRAM) cell are degraded because of the increased mismatch among its transistors. Extremely thin silicon-on-insulator is one of the attractive candidates to reduce this mismatch, and it offers an independent back-gate control using a thin buried oxide. The implementation of back-gate control has recently attracted much interest to improve the read stability and write ability. In this paper, we propose a selective cell current (ICELL) boosting scheme (SIB) and an asymmetric back-gate control write-assist (ABC-WA) circuit. SIB enhances the read performance by selectively boosting ICELL of the SRAM cells. ABC-WA enhances the write ability by forward biasing the NMOSs at one side, which improves the write ability with reduction in the dynamic power overhead and without requiring a voltage generator. The proposed SRAM design improves the read performance and energy by 38.6% and 24.9%, respectively.
|Number of pages||8|
|Journal||IEEE Transactions on Circuits and Systems I: Regular Papers|
|Publication status||Published - 2015 Jun 1|
Bibliographical notePublisher Copyright:
© 2004-2012 IEEE.
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering