Strain behavior of epitaxial Si1 - xCx films on silicon substrates during dry oxidation

S. W. Kim, J. H. Yoo, S. M. Koo, H. J. Lee, D. H. Ko

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Strain behavior of epitaxial Si1 - xCx films on silicon substrates during dry oxidation'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemistry