Strain-conserving doping of a pseudomorphic metastable Ge0.06Si0.94 layer on Si(100) by low-dose BF+2 implantation

S. Im, F. Eisen, M. A. Nicolet, M. O. Tanner, K. L. Wang, N. D. Theodore

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

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