Strong enhancement of emissions from nanostructured ZnO thin films grown by plasma-assisted molecular-beam epitaxy on nanopored Si(001) substrates

Jun Ho Choi, Seok Kyu Man, Soon Ku Hong, Jung Hoon Song, Se Young Jeong, You Suk Cho, Dojin Kim, Yoon Sung Nam, Kyung Seon Baek, Soo Kyung Chang, Takafumi Yao

Research output: Contribution to journalArticle


Nanostructured ZnO films were fabricated on nanopored Si(001) surfaces through reactive ion etching and plasmaassisted molecular-beam epitaxy techniques. Nanowall-like nanostructures were formed on the ZnO film surfaces depending on the thickness of the ZnO films. Significant enhancement of the photoluminescence intensity up to 15 fold was observed from the nanostructured ZnO films. We found that the emission properties of the film changed very sensitively with the nanostructure on the surface and the enhancement is closely related to the formations of nanostructures on the surface of the ZnO films, not at the interface between the films and the substrate.

Original languageEnglish
Pages (from-to)1598-1601
Number of pages4
JournalPhysica Status Solidi (A) Applications and Materials Science
Issue number7
Publication statusPublished - 2008 Jul 1


All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this