Strong enhancement of emissions from nanostructured ZnO thin films grown by plasma-assisted molecular-beam epitaxy on nanopored Si(001) substrates

Jun Ho Choi, Seok Kyu Man, Soon Ku Hong, Jung Hoon Song, Se Young Jeong, You Suk Cho, Dojin Kim, Yoon Sung Nam, Kyung Seon Baek, Soo Kyung Chang, Takafumi Yao

Research output: Contribution to journalArticle

Abstract

Nanostructured ZnO films were fabricated on nanopored Si(001) surfaces through reactive ion etching and plasmaassisted molecular-beam epitaxy techniques. Nanowall-like nanostructures were formed on the ZnO film surfaces depending on the thickness of the ZnO films. Significant enhancement of the photoluminescence intensity up to 15 fold was observed from the nanostructured ZnO films. We found that the emission properties of the film changed very sensitively with the nanostructure on the surface and the enhancement is closely related to the formations of nanostructures on the surface of the ZnO films, not at the interface between the films and the substrate.

Original languageEnglish
Pages (from-to)1598-1601
Number of pages4
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume205
Issue number7
DOIs
Publication statusPublished - 2008 Jul 1

Fingerprint

Molecular beam epitaxy
molecular beam epitaxy
Plasmas
Thin films
augmentation
Substrates
thin films
Nanostructures
Reactive ion etching
Photoluminescence
etching
photoluminescence
ions

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Choi, Jun Ho ; Man, Seok Kyu ; Hong, Soon Ku ; Song, Jung Hoon ; Jeong, Se Young ; Cho, You Suk ; Kim, Dojin ; Nam, Yoon Sung ; Baek, Kyung Seon ; Chang, Soo Kyung ; Yao, Takafumi. / Strong enhancement of emissions from nanostructured ZnO thin films grown by plasma-assisted molecular-beam epitaxy on nanopored Si(001) substrates. In: Physica Status Solidi (A) Applications and Materials Science. 2008 ; Vol. 205, No. 7. pp. 1598-1601.
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abstract = "Nanostructured ZnO films were fabricated on nanopored Si(001) surfaces through reactive ion etching and plasmaassisted molecular-beam epitaxy techniques. Nanowall-like nanostructures were formed on the ZnO film surfaces depending on the thickness of the ZnO films. Significant enhancement of the photoluminescence intensity up to 15 fold was observed from the nanostructured ZnO films. We found that the emission properties of the film changed very sensitively with the nanostructure on the surface and the enhancement is closely related to the formations of nanostructures on the surface of the ZnO films, not at the interface between the films and the substrate.",
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Strong enhancement of emissions from nanostructured ZnO thin films grown by plasma-assisted molecular-beam epitaxy on nanopored Si(001) substrates. / Choi, Jun Ho; Man, Seok Kyu; Hong, Soon Ku; Song, Jung Hoon; Jeong, Se Young; Cho, You Suk; Kim, Dojin; Nam, Yoon Sung; Baek, Kyung Seon; Chang, Soo Kyung; Yao, Takafumi.

In: Physica Status Solidi (A) Applications and Materials Science, Vol. 205, No. 7, 01.07.2008, p. 1598-1601.

Research output: Contribution to journalArticle

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AU - Choi, Jun Ho

AU - Man, Seok Kyu

AU - Hong, Soon Ku

AU - Song, Jung Hoon

AU - Jeong, Se Young

AU - Cho, You Suk

AU - Kim, Dojin

AU - Nam, Yoon Sung

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AU - Chang, Soo Kyung

AU - Yao, Takafumi

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