The sputter-deposited fcc-MgO (001)/bcc-Co40Fe40B20 (001) spin-tunnel contact (STC) was succebfully prepared on n-Ge(001). We found that the interfacial modification by ultrathin (6 A) Mg insertion at the interface between n-Ge and MgO plays an important role in spin injection into Ge. The significantly amplified spin accumulation was observed in this STC as a result of the structural modification. The three-terminal Hanle signal of this STC was 2.7 times larger than that of the STC without Mg insertion. Our study confirms that a sputtering technique is indeed practical and useful to modify interfacial structures for the efficient injection of spins into semiconductors.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)