Structural and optical features of Si-rich SiO2 films prepared by magnetron sputter techniques

S. W. Kim, N. H. Cho, Seongil Im

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.

Original languageEnglish
Pages (from-to)949-952
Number of pages4
JournalMaterials Science Forum
Volume449-452
Issue numberII
Publication statusPublished - 2004 Jul 26
EventDesigning, Processing and Properties of Advanced Engineering Materials: Proceedings on the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials - Jeju Island, Korea, Republic of
Duration: 2003 Nov 52003 Nov 8

Fingerprint

Nanocrystallites
heat treatment
Heat treatment
matrices
crystallinity
Thin films
Wavelength
thin films
wavelengths
Temperature

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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title = "Structural and optical features of Si-rich SiO2 films prepared by magnetron sputter techniques",
abstract = "Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.",
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Structural and optical features of Si-rich SiO2 films prepared by magnetron sputter techniques. / Kim, S. W.; Cho, N. H.; Im, Seongil.

In: Materials Science Forum, Vol. 449-452, No. II, 26.07.2004, p. 949-952.

Research output: Contribution to journalConference article

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N2 - Si-rich SiO2 (SRSO) films were prepared by RF magnetron sputter techniques, and the structural and optical features of nanocrystalline Si (nc-Si) embedded in the SiO2 matrix were investigated in terms of post-deposition heat-treatment conditions. The SRSO thin films exhibited PL phenomena in the wavelength range of (450 - 500 nm). Post-deposition heat-treatment at relatively high temperature like 1000 - 1100°C increased the crystallinity of the films as well as the volume of the Si nanocrystallites (and SiO2), and as a result, PL intensity was enhanced in the visible light region. The nc-Si embedded in SiO2 matrix is a few nanometers in size. It is believed that the Si nanocrystallites in the post-deposition annealed films are isolated and well passivated by SiO2.

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