Structural and optical properties of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition

Joo Han Kim, Hong Koo Baik

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Thin films of amorphous hydrogenated carbon nitride (a-CNx : H) were deposited from CH4 and N2 gases by plasma-enhanced chemical vapor deposition using a helical resonator discharge. The effects of substrate temperature on the structural and optical properties of the films have been systematically investigated by Raman spectroscopy and transmission ultraviolet-visible spectroscopy. The optical band gap of the a-CNx : H films was found to decrease from 1.72 to 0.95 eV as the substrate temperature is increased to 250°C. Through the relationship between optical band gap and Raman studies, it could be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature.

Original languageEnglish
Pages (from-to)653-656
Number of pages4
JournalSolid State Communications
Issue number11
Publication statusPublished - 1997 Jan 1


All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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