Structural transition of crystalline Y2O3 film on Si(111) with substrate temperature

Mann-Ho Cho, Dae Hong Ko, KwangHo Jeong, S. W. Whangbo, C. N. Whang, S. C. Choi, S. J. Cho

Research output: Contribution to journalArticle

55 Citations (Scopus)

Abstract

Crystalline Y2O3 films on Si(111) were grown by ionized cluster beam (ICB) deposition in an ultra high vacuum (UHV). The crystallinity of the films deposited at several different temperatures was studied using X-ray diffraction (XRD) and reflection of high-energy electron diffraction (RHEED), and the chemical states of the films was investigated using X-ray photoelectron spectroscopy (XPS). The transformation from monoclinic to cubic structure was observed upon the increase of the substrate temperature from 100 °C to 500 °C. The single crystal cubic structure was obtained at substrate temperatures over 500 °C. The stoichiometry and binding state in the films were gradually changed to a cubic Y2O3 structure with the increase of the substrate temperature. The transformation of the film structure from a monoclinic structure to a cubic structure was also observed by post annealing treatment in an oxygen ambient.

Original languageEnglish
Pages (from-to)266-269
Number of pages4
JournalThin Solid Films
Volume349
Issue number1
DOIs
Publication statusPublished - 1999 Jul 30

Fingerprint

Crystalline materials
Substrates
Temperature
High energy electron diffraction
temperature
Ultrahigh vacuum
Stoichiometry
high energy electrons
ultrahigh vacuum
stoichiometry
crystallinity
x rays
X ray photoelectron spectroscopy
electron diffraction
photoelectron spectroscopy
Single crystals
Annealing
Oxygen
X ray diffraction
annealing

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Cho, Mann-Ho ; Ko, Dae Hong ; Jeong, KwangHo ; Whangbo, S. W. ; Whang, C. N. ; Choi, S. C. ; Cho, S. J. / Structural transition of crystalline Y2O3 film on Si(111) with substrate temperature. In: Thin Solid Films. 1999 ; Vol. 349, No. 1. pp. 266-269.
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Structural transition of crystalline Y2O3 film on Si(111) with substrate temperature. / Cho, Mann-Ho; Ko, Dae Hong; Jeong, KwangHo; Whangbo, S. W.; Whang, C. N.; Choi, S. C.; Cho, S. J.

In: Thin Solid Films, Vol. 349, No. 1, 30.07.1999, p. 266-269.

Research output: Contribution to journalArticle

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