Studies on the structure and bonding state of nitric amorphous carbon (a-CNx) films by reactive rf magnetron sputtering

Hae Suk Jung, Hyung-Ho Park

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

This manuscript reports on the structure, bonding states of nitric amorphous carbon (a-CNx) films and its correlation with electrical, optical properties with post-annealing treatment. a-CNx films were deposited on Si(100) by reactive rf magnetron sputtering using a gas mixture of Ar and N2. X-ray photoelectron spectroscopy revealed that there are two different C-N bonding states where N is bonded to both sp2 and sp3 C atoms. The amount of N-sp3 C bond is proportional to the N/C atomic ratio in a-CNx. As the amount of N-sp3 C bond decreased with annealing, total sp3/sp2 bond ratio, resistivity, density and refractive index also decreased. Compared to amorphous carbon (a-C), a slow decrease tendency of total sp3/sp2 bond ratio was observed in a-CNx due to thermal resistance of the N-sp3 C bond.

Original languageEnglish
Pages (from-to)320-325
Number of pages6
JournalThin Solid Films
Volume377-378
DOIs
Publication statusPublished - 2000 Dec 1

Fingerprint

Reactive sputtering
Amorphous carbon
Magnetron sputtering
magnetron sputtering
indexes (ratios)
Annealing
annealing
carbon
thermal resistance
Heat resistance
Gas mixtures
gas mixtures
Refractive index
tendencies
X ray photoelectron spectroscopy
Optical properties
photoelectron spectroscopy
refractivity
optical properties
Atoms

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

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abstract = "This manuscript reports on the structure, bonding states of nitric amorphous carbon (a-CNx) films and its correlation with electrical, optical properties with post-annealing treatment. a-CNx films were deposited on Si(100) by reactive rf magnetron sputtering using a gas mixture of Ar and N2. X-ray photoelectron spectroscopy revealed that there are two different C-N bonding states where N is bonded to both sp2 and sp3 C atoms. The amount of N-sp3 C bond is proportional to the N/C atomic ratio in a-CNx. As the amount of N-sp3 C bond decreased with annealing, total sp3/sp2 bond ratio, resistivity, density and refractive index also decreased. Compared to amorphous carbon (a-C), a slow decrease tendency of total sp3/sp2 bond ratio was observed in a-CNx due to thermal resistance of the N-sp3 C bond.",
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Studies on the structure and bonding state of nitric amorphous carbon (a-CNx) films by reactive rf magnetron sputtering. / Jung, Hae Suk; Park, Hyung-Ho.

In: Thin Solid Films, Vol. 377-378, 01.12.2000, p. 320-325.

Research output: Contribution to journalArticle

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AB - This manuscript reports on the structure, bonding states of nitric amorphous carbon (a-CNx) films and its correlation with electrical, optical properties with post-annealing treatment. a-CNx films were deposited on Si(100) by reactive rf magnetron sputtering using a gas mixture of Ar and N2. X-ray photoelectron spectroscopy revealed that there are two different C-N bonding states where N is bonded to both sp2 and sp3 C atoms. The amount of N-sp3 C bond is proportional to the N/C atomic ratio in a-CNx. As the amount of N-sp3 C bond decreased with annealing, total sp3/sp2 bond ratio, resistivity, density and refractive index also decreased. Compared to amorphous carbon (a-C), a slow decrease tendency of total sp3/sp2 bond ratio was observed in a-CNx due to thermal resistance of the N-sp3 C bond.

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