Studies on the structure and bonding state of nitric amorphous carbon (a-CNx) films by reactive rf magnetron sputtering

Hae Suk Jung, Hyung-Ho Park

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Abstract

This manuscript reports on the structure, bonding states of nitric amorphous carbon (a-CNx) films and its correlation with electrical, optical properties with post-annealing treatment. a-CNx films were deposited on Si(100) by reactive rf magnetron sputtering using a gas mixture of Ar and N2. X-ray photoelectron spectroscopy revealed that there are two different C-N bonding states where N is bonded to both sp2 and sp3 C atoms. The amount of N-sp3 C bond is proportional to the N/C atomic ratio in a-CNx. As the amount of N-sp3 C bond decreased with annealing, total sp3/sp2 bond ratio, resistivity, density and refractive index also decreased. Compared to amorphous carbon (a-C), a slow decrease tendency of total sp3/sp2 bond ratio was observed in a-CNx due to thermal resistance of the N-sp3 C bond.

Original languageEnglish
Pages (from-to)320-325
Number of pages6
JournalThin Solid Films
Volume377-378
DOIs
Publication statusPublished - 2000 Dec 1

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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