This manuscript reports on the structure, bonding states of nitric amorphous carbon (a-CNx) films and its correlation with electrical, optical properties with post-annealing treatment. a-CNx films were deposited on Si(100) by reactive rf magnetron sputtering using a gas mixture of Ar and N2. X-ray photoelectron spectroscopy revealed that there are two different C-N bonding states where N is bonded to both sp2 and sp3 C atoms. The amount of N-sp3 C bond is proportional to the N/C atomic ratio in a-CNx. As the amount of N-sp3 C bond decreased with annealing, total sp3/sp2 bond ratio, resistivity, density and refractive index also decreased. Compared to amorphous carbon (a-C), a slow decrease tendency of total sp3/sp2 bond ratio was observed in a-CNx due to thermal resistance of the N-sp3 C bond.
Bibliographical noteFunding Information:
This work was partially supported by the Yonsei University Research Fund of 1999 and the Brain Korea 21 project.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry