Study on the precursors for La2O3 thin films deposited on silicon substrate

Jino Jun, Jin Hyung Jun, Doo Jin Choi

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

La2O3 thin films were deposited using the DLI-MOCVD and MOCVD method with the precursors of La(tmhd)3, La(tmhd)3- tetraglyme and La(tmhd)3-TETEA. The properties of the La2O3 thin films were characterized.

Original languageEnglish
Pages (from-to)1847-1849
Number of pages3
JournalJournal of Materials Science Letters
Volume21
Issue number23
DOIs
Publication statusPublished - 2002 Dec 1

Bibliographical note

Funding Information:
This work was supported by Brain Korea 21 Project.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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