La2O3 thin films were deposited using the DLI-MOCVD and MOCVD method with the precursors of La(tmhd)3, La(tmhd)3- tetraglyme and La(tmhd)3-TETEA. The properties of the La2O3 thin films were characterized.
Bibliographical noteFunding Information:
This work was supported by Brain Korea 21 Project.
All Science Journal Classification (ASJC) codes
- Materials Science(all)