Sub-100 nm Patterning with an Amorphous Fluoropolymer Mold

Dahl Young Khang, Hong H. Lee

Research output: Contribution to journalArticle

83 Citations (Scopus)

Abstract

A fluoropolymer mold is introduced and used to pattern sub-100 mn features with the characteristics that cause problems in patterning with a mold. The low surface energy and inertness, stiffness, and permeable nature of the mold material make it possible to pattern without surface treatment densely populated very fine features, mixed patterns of small and large features, and features with a high aspect ratio, when the mold is used with a polymer solution for the patterning. The ultraviolet transparency of the mold material also allows for patterning with photocurable pre-polymers.

Original languageEnglish
Pages (from-to)2445-2448
Number of pages4
JournalLangmuir
Volume20
Issue number6
DOIs
Publication statusPublished - 2004 Mar 16

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All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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