Sub-micro to nanometer scale laser direct writing techniques with a contact probe

Howon Jung, Yongwoo Kim, Seok Kim, Jinhee Jang, Jae Won Hahn

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Modern laser direct writing techniques provide tools for high-precision fabrication and manufacturing at the micro scale. As the integration of devices increases, the feature size is being reduced to the nanometer scale. In this paper, we developed a contact-probe-based laser direct writing technique that covers the sub-micro to nanometer scale. The proposed probe uses a solid immersion lens or a nanoaperture to enhance the resolution in a near-field writing method. We integrated several of the proposed probes with a conventional laser direct writing system and achieved pattern resolutions up to 35 nm with a 405 nm wavelength laser. Furthermore, the scanning speed (~ 10 mm/s) of the probes was high enough to use it in actual industry fabrication processes. With the proposed probe-based system, electronic, photonic, or plasmonic devices that require sub-micro meter scale features can be fabricated by means of laser direct writing. The minimum width of the line pattern recorded with the plasmonic device was 35nm.

Original languageEnglish
Pages (from-to)877-883
Number of pages7
JournalInternational Journal of Precision Engineering and Manufacturing
Volume12
Issue number5
DOIs
Publication statusPublished - 2011 Oct 1

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Lasers
Fabrication
Photonics
Lenses
Scanning
Wavelength
Industry

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Cite this

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abstract = "Modern laser direct writing techniques provide tools for high-precision fabrication and manufacturing at the micro scale. As the integration of devices increases, the feature size is being reduced to the nanometer scale. In this paper, we developed a contact-probe-based laser direct writing technique that covers the sub-micro to nanometer scale. The proposed probe uses a solid immersion lens or a nanoaperture to enhance the resolution in a near-field writing method. We integrated several of the proposed probes with a conventional laser direct writing system and achieved pattern resolutions up to 35 nm with a 405 nm wavelength laser. Furthermore, the scanning speed (~ 10 mm/s) of the probes was high enough to use it in actual industry fabrication processes. With the proposed probe-based system, electronic, photonic, or plasmonic devices that require sub-micro meter scale features can be fabricated by means of laser direct writing. The minimum width of the line pattern recorded with the plasmonic device was 35nm.",
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Sub-micro to nanometer scale laser direct writing techniques with a contact probe. / Jung, Howon; Kim, Yongwoo; Kim, Seok; Jang, Jinhee; Hahn, Jae Won.

In: International Journal of Precision Engineering and Manufacturing, Vol. 12, No. 5, 01.10.2011, p. 877-883.

Research output: Contribution to journalArticle

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