Surface preparation and effective contact formation for GaAs surface

Min Gu Kang, Hyung-Ho Park

Research output: Contribution to journalConference article

31 Citations (Scopus)

Abstract

(NH4)2S solution was applied to surface-cleaned (etched) GaAs using various kinds of solution and method to investigate the passivation mechanism. After cleaning with HCl and 3PO4, elemental As remained on GaAs surface and successive sulfidation treatments resulted in the formation of As-S bond. However, there was no As-S bond observed after the sulfidation of NH4OH-cleaned GaAs because elemental As was dissolved in NH4OH solution. The thermally cleaned GaAs surface at 600°C containing a large amount of elemental Ga on surface showed the formation of Ga-S bond after sulfidation treatment. Therefore, it could be confirmed that the elemental forms of As and Ga bind with S and produce Ga-S and As-S bonds, which induce the passivation effect on GaAs. A new technique using sulfidation and subsequent hydrogenation treatment was studied to minimize defective interfacial bonds of metal(Pd, Au)/GaAs Schottky contact. Sulfur-passivation was effective to make metal/GaAs interface completely free of GaAs oxides, and hydrogenation treatment after the deposition of metal ultrathin film was introduced to control the defective As compounds originated from the metallization. After the treatment, the reverse leakage current of the Schottky diode was dramatically reduced about 10 times, compared with the simply S-passivated sample. Furthermore, from capacitance-voltage (C-V) dopant profile, these sulfidation and subsequent hydrogenation processes were found to cause no damage to the GaAs substrate.

Original languageEnglish
Pages (from-to)91-100
Number of pages10
JournalVacuum
Volume67
Issue number1
DOIs
Publication statusPublished - 2002 Sep 2
Event2nd International Seminar On Semiconductor Surface Passivation (SSP'2001) - Ustron, Poland
Duration: 2001 Sep 102001 Sep 13

Fingerprint

sulfidation
Contacts (fluid mechanics)
Passivation
Hydrogenation
preparation
passivity
hydrogenation
Metals
Ultrathin films
Metallizing
Leakage currents
Cleaning
Diodes
Schottky diodes
Capacitance
metal films
Sulfur
metals
cleaning
Doping (additives)

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

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title = "Surface preparation and effective contact formation for GaAs surface",
abstract = "(NH4)2S solution was applied to surface-cleaned (etched) GaAs using various kinds of solution and method to investigate the passivation mechanism. After cleaning with HCl and 3PO4, elemental As remained on GaAs surface and successive sulfidation treatments resulted in the formation of As-S bond. However, there was no As-S bond observed after the sulfidation of NH4OH-cleaned GaAs because elemental As was dissolved in NH4OH solution. The thermally cleaned GaAs surface at 600°C containing a large amount of elemental Ga on surface showed the formation of Ga-S bond after sulfidation treatment. Therefore, it could be confirmed that the elemental forms of As and Ga bind with S and produce Ga-S and As-S bonds, which induce the passivation effect on GaAs. A new technique using sulfidation and subsequent hydrogenation treatment was studied to minimize defective interfacial bonds of metal(Pd, Au)/GaAs Schottky contact. Sulfur-passivation was effective to make metal/GaAs interface completely free of GaAs oxides, and hydrogenation treatment after the deposition of metal ultrathin film was introduced to control the defective As compounds originated from the metallization. After the treatment, the reverse leakage current of the Schottky diode was dramatically reduced about 10 times, compared with the simply S-passivated sample. Furthermore, from capacitance-voltage (C-V) dopant profile, these sulfidation and subsequent hydrogenation processes were found to cause no damage to the GaAs substrate.",
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Surface preparation and effective contact formation for GaAs surface. / Kang, Min Gu; Park, Hyung-Ho.

In: Vacuum, Vol. 67, No. 1, 02.09.2002, p. 91-100.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Surface preparation and effective contact formation for GaAs surface

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AU - Park, Hyung-Ho

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Y1 - 2002/9/2

N2 - (NH4)2S solution was applied to surface-cleaned (etched) GaAs using various kinds of solution and method to investigate the passivation mechanism. After cleaning with HCl and 3PO4, elemental As remained on GaAs surface and successive sulfidation treatments resulted in the formation of As-S bond. However, there was no As-S bond observed after the sulfidation of NH4OH-cleaned GaAs because elemental As was dissolved in NH4OH solution. The thermally cleaned GaAs surface at 600°C containing a large amount of elemental Ga on surface showed the formation of Ga-S bond after sulfidation treatment. Therefore, it could be confirmed that the elemental forms of As and Ga bind with S and produce Ga-S and As-S bonds, which induce the passivation effect on GaAs. A new technique using sulfidation and subsequent hydrogenation treatment was studied to minimize defective interfacial bonds of metal(Pd, Au)/GaAs Schottky contact. Sulfur-passivation was effective to make metal/GaAs interface completely free of GaAs oxides, and hydrogenation treatment after the deposition of metal ultrathin film was introduced to control the defective As compounds originated from the metallization. After the treatment, the reverse leakage current of the Schottky diode was dramatically reduced about 10 times, compared with the simply S-passivated sample. Furthermore, from capacitance-voltage (C-V) dopant profile, these sulfidation and subsequent hydrogenation processes were found to cause no damage to the GaAs substrate.

AB - (NH4)2S solution was applied to surface-cleaned (etched) GaAs using various kinds of solution and method to investigate the passivation mechanism. After cleaning with HCl and 3PO4, elemental As remained on GaAs surface and successive sulfidation treatments resulted in the formation of As-S bond. However, there was no As-S bond observed after the sulfidation of NH4OH-cleaned GaAs because elemental As was dissolved in NH4OH solution. The thermally cleaned GaAs surface at 600°C containing a large amount of elemental Ga on surface showed the formation of Ga-S bond after sulfidation treatment. Therefore, it could be confirmed that the elemental forms of As and Ga bind with S and produce Ga-S and As-S bonds, which induce the passivation effect on GaAs. A new technique using sulfidation and subsequent hydrogenation treatment was studied to minimize defective interfacial bonds of metal(Pd, Au)/GaAs Schottky contact. Sulfur-passivation was effective to make metal/GaAs interface completely free of GaAs oxides, and hydrogenation treatment after the deposition of metal ultrathin film was introduced to control the defective As compounds originated from the metallization. After the treatment, the reverse leakage current of the Schottky diode was dramatically reduced about 10 times, compared with the simply S-passivated sample. Furthermore, from capacitance-voltage (C-V) dopant profile, these sulfidation and subsequent hydrogenation processes were found to cause no damage to the GaAs substrate.

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