Atomic layer deposition (ALD) has been considered as a promising thin film deposition technique for nanoscale semiconductor device fabrication. Recently, however, the exclusive benefits of ALD make it viable tool for nanotechnology. In this presentation, I will present several examples on the application of ALD for low dimensional nanomaterial synthesis. Due to its excellent conformality, ALD is an ideal technique to produce nanomaterials with combination of nanopatterning techniques. Utilizing highly conformai ZnO ALD on the nanohole arrays made by anodized aluminum oxide nanotemplates, low dimensional nanostructures were fabricated and applied for the fabrication of high performance gas sensor. Also, using highly conformai transition metal ALD processes followed by annealing, silicide nanowires were synthesized. Moreover, by adding SiH 4 to the NH 3 plasma reactant during Co plasma-enhanced ALD process, Co nanorod array was formed on Si substrates without using nanotemplates.