The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display

Hyungjun Kim, Woo Hee Kim, Han Bo Ram Lee, S. J. Lim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Atomic layer deposition (ALD) is a promising deposition technique for nanoscale device fabrication due to its great benefits including excellent conformality, atomic scale thickness control, high quality deposition at low growth temperature, and large area uniformity. In this presentation, we will present a couple of examples for novel applications of ALD; metallic nanomaterial fabrications combined by nanotemplate utilizing the excellent conformality of ALD and fabrication of driving devices for transparent flexible displays utilizing the ability of ALD to produce high quality materials at low growth temperature. These examples manifest the benefits of ALD in the near future industry.

Original languageEnglish
Title of host publicationECS Transactions - Atomic Layer Deposition Applications 5
Pages101-111
Number of pages11
Volume25
Edition4
Publication statusPublished - 2009 Dec 1
Event5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society - Vienna, Austria
Duration: 2009 Oct 52009 Oct 7

Other

Other5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society
CountryAustria
CityVienna
Period09/10/509/10/7

Fingerprint

Flexible displays
Atomic layer deposition
Nanostructured materials
Fabrication
Growth temperature
Thickness control
Industry

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Kim, H., Kim, W. H., Lee, H. B. R., & Lim, S. J. (2009). The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display. In ECS Transactions - Atomic Layer Deposition Applications 5 (4 ed., Vol. 25, pp. 101-111)
Kim, Hyungjun ; Kim, Woo Hee ; Lee, Han Bo Ram ; Lim, S. J. / The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display. ECS Transactions - Atomic Layer Deposition Applications 5. Vol. 25 4. ed. 2009. pp. 101-111
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Kim, H, Kim, WH, Lee, HBR & Lim, SJ 2009, The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display. in ECS Transactions - Atomic Layer Deposition Applications 5. 4 edn, vol. 25, pp. 101-111, 5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society, Vienna, Austria, 09/10/5.

The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display. / Kim, Hyungjun; Kim, Woo Hee; Lee, Han Bo Ram; Lim, S. J.

ECS Transactions - Atomic Layer Deposition Applications 5. Vol. 25 4. ed. 2009. p. 101-111.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Kim H, Kim WH, Lee HBR, Lim SJ. The benefits of atomic layer deposition in non-semiconductor applications; producing metallic nanomaterials and fabrication of flexible display. In ECS Transactions - Atomic Layer Deposition Applications 5. 4 ed. Vol. 25. 2009. p. 101-111