The changing behavior of the dielectric constant of a-SiC:H films deposited by remote PECVD with various deposition conditions using HMDS and PPCS

S. H. Cho, Y. Y. Choi, Y. H. Kim, D. J. Choi

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science