The effect of ion-beam bombardment on solution-processed nickel oxide films used for liquid crystal alignment

Hae Chang Jeong, Jonghoon Won, Ju Hwan Lee, Dong Hyun Kim, Dong Wook Lee, Yun Gun Lee, Byeong Yun Oh, Jeong min Han, Dae Shik Seo

Research output: Contribution to journalArticle

Abstract

We induced a homogeneous liquid crystal (LC) alignment state on ion-beam (IB)-irradiated NiO films fabricated via solution-processing. A topographical analysis was performed using field emission-scanning electron microscopy of the films after various annealing temperatures. After IB irradiation, the surface of the NiO films was rough irrespective of annealing temperature. IB-irradiated NiO films exhibited slightly reduced transparency in the visible region compared to as-deposited NiO film. Moreover, the IB-irradiated NiO films fabricated at the lowest annealing temperature of 100°C exhibited uniform homogeneous LC alignment caused by microgroove-like topographic modification and chemical modification of the NiO surface by the IB irradiation. The pretilt angle of the LC molecules on IB-irradiated NiO film annealed at 100, 200, 300, and 400°C were on average 0.02 0.05, 0.43, and 0.05o, respectively, making IB-irradiated NiO film eminently suitable for LC alignment.

Original languageEnglish
Pages (from-to)R66-R69
JournalECS Journal of Solid State Science and Technology
Volume8
Issue number4
DOIs
Publication statusPublished - 2019 Jan 1

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

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