The effects of dual-active-layer modulation on a low-temperature solution-processed oxide thin-film transistor

Woong Hee Jeong, Kyung Min Kim, Dong Lim Kim, You Seung Rim, Hyun Jae Kim

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20 Citations (Scopus)

Abstract

We applied dual-active-layer (DAL) modulation to solution-processed AlInZnO (AIZO)/InZnO (IZO) DAL thin-film transistors (TFTs) to realize high performance at 350 °C. The electrical characteristics of the DAL TFTs were affected by the In-versus-Zn ratio of each channel and the thickness of the IZO. This caused a difference in the carrier concentrations of the two channels and also changed the energy barrier height at the junction between the channels. A DAL TFT with optimized carrier concentration and energy barrier height yielded a competitive field-effect mobility of 5.62 cm 2/V · s, a high on/off ratio of 9.0 × 10 6, and a steep subthreshold swing of 0.53 V/dec.

Original languageEnglish
Article number6204080
Pages (from-to)2149-2152
Number of pages4
JournalIEEE Transactions on Electron Devices
Volume59
Issue number8
DOIs
Publication statusPublished - 2012

Bibliographical note

Funding Information:
Manuscript received January 16, 2012; revised April 9, 2012; accepted April 27, 2012. Date of publication May 23, 2012; date of current version July 19, 2012. This work was supported by the National Research Foundation of Korea Grant funded by the Korean Ministry of Education, Science and Technology [no. 2011-0028819]. The review of this paper was arranged by Editor A. C. Arias.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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