The effects of postannealing treatment in forming gas on low-k SiOC(H) film

S. H. Park, H. J. Kim, M. H. Cho, D. H. Ko, H. C. Sohn, J. H. Hahn, D. H. Lee, Y. S. Kwon, S. Y. Park, M. S. Kim

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Engineering & Materials Science

Chemical Compounds