The influence of oxygen high pressure annealing on the performance and bias instability of amorphous Ge-In-Ga-O thin film transistors

Byung Du Ahn, Hyun Suk Kim, You Seung Rim, Jin Seong Park, Heon Je Kim

Research output: Contribution to journalArticle

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)4132
Number of pages4136
JournalIEEE Transactions on Electron Devices
Volume61
Issue number12
Publication statusPublished - 2014 Oct

Cite this