The role of vacuum ultraviolet in H 2 plasma treatment on SiO 2 aerogel film

Sang Bae Jung, Hyung-Ho Park, Haecheon Kim

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

SiO 2 aerogel film has been drawn an attention as excellent dielectric material due to its ultra low dielectric constant. SiO 2 aerogel film could exhibit the improved electrical property after plasma treatment due to the removal of organic group. However, the role of vacuum ultraviolet (VUV) was not investigated in spite of high energy of VUV radiated during plasma processing. In this work, the radiation effect of VUV on SiO 2 aerogel film was investigated during H 2 plasma treatment. H 2 gas was selected from its lightest atomic mass and strong photon emission in the VUV region. LiF single crystal was used as a VUV filter to permit the transmittance of the VUV radiated from H 2 plasma but not with chemical species and reactive ions. It was found that VUV radiation during H 2 plasma treatment plays a role of removal of organic group and rearrangement of siloxane bond.

Original languageEnglish
Pages (from-to)156-162
Number of pages7
JournalApplied Surface Science
Volume216
Issue number1-4 SPEC.
DOIs
Publication statusPublished - 2003 Jun 30

Fingerprint

Aerogels
Vacuum
Plasmas
Siloxanes
Plasma applications
Radiation effects
Ultraviolet radiation
Electric properties
Permittivity
Photons
Gases
Single crystals
Ions

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

Jung, Sang Bae ; Park, Hyung-Ho ; Kim, Haecheon. / The role of vacuum ultraviolet in H 2 plasma treatment on SiO 2 aerogel film In: Applied Surface Science. 2003 ; Vol. 216, No. 1-4 SPEC. pp. 156-162.
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The role of vacuum ultraviolet in H 2 plasma treatment on SiO 2 aerogel film . / Jung, Sang Bae; Park, Hyung-Ho; Kim, Haecheon.

In: Applied Surface Science, Vol. 216, No. 1-4 SPEC., 30.06.2003, p. 156-162.

Research output: Contribution to journalArticle

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