Thermal modeling and measurement of GaN-based HFET devices

Jeong Park, Moo Whan Shin, Chin C. Lee

Research output: Contribution to journalLetterpeer-review

50 Citations (Scopus)


In this letter, we present our thermal study results of GaN-based heterojunction field effect transistors (HFETs). In thermal computation, PAMICE code was used to calculate temperatures in a three-dimension (3-D) model. In the rmal measurement, nematic liquid crystal thermography was employed to determine the peak temperature on the surface of the device chip. The calculated and directly measured temperatures agree well. These methods are valuable in predicting the thermal performance of GaN-based HFET devices, in particular the power devices.

Original languageEnglish
Pages (from-to)424-426
Number of pages3
JournalIEEE Electron Device Letters
Issue number7
Publication statusPublished - 2003 Jul

Bibliographical note

Funding Information:
Manuscript received February 20, 2003; revised April 9, 2003. This work was supported by a Korean Research Foundation Grant KRF-2001-042-E00095. This review of this letter was arranged by Editor D. Ueda. J. Park and C. C. Lee are with the Department of Electrical and Computer Engineering, University of California, Irvine, CA 92697 USA. M. W. Shin is with the Semiconductor Materials/Devices Laboratory, Department of Ceramic Engineering, Myong Ji University, Kyunggi, Korea 449-728. Digital Object Identifier 10.1109/LED.2003.814020

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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