Thermal decomposition of HfO2-Al2O3 nanolaminate film was discussed. The laminate stack was grown by atomic layer chemical vapor deposition and was studied by medium-energy ion scattering spectroscopy and high-resolution X-ray photoelectron spectroscopy. The experiments were performed in the ultrahigh vacuum conditions and at a temperature level of 800°C. It was found that at 850°C the quality of Hf-Al oxides was degraded and caused silicide to form on the surface.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)