Thermal stability and decomposition of the HfO2Al 2O3 laminate system

Hyo Sik Chang, Hyunsang Hwang, Mann Ho Cho, Dae Won Moon, Seok Joo Doh, Jong Ho Lee, Nae In Lee

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)


Thermal decomposition of HfO2-Al2O3 nanolaminate film was discussed. The laminate stack was grown by atomic layer chemical vapor deposition and was studied by medium-energy ion scattering spectroscopy and high-resolution X-ray photoelectron spectroscopy. The experiments were performed in the ultrahigh vacuum conditions and at a temperature level of 800°C. It was found that at 850°C the quality of Hf-Al oxides was degraded and caused silicide to form on the surface.

Original languageEnglish
Pages (from-to)28-30
Number of pages3
JournalApplied Physics Letters
Issue number1
Publication statusPublished - 2004 Jan 5

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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