Thermal stability of ALD-HfO 2GaAs pretreated with trimethylaluminium

Young Chul Byun, Chee Hong An, Seok Hee Lee, Mann Ho Cho, Hyoungsub Kim

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The simultaneous self-cleaning and passivation of an as-received GaAs substrate using trimethylaluminium (TMA) pretreatment before the atomic layer deposition (ALD) of HfO 2 was systematically investigated. The change of the interfacial characteristics was probed as a function of the number of treatment cycles and the post-deposition annealing temperature and related with various electrical properties of the HfO 2 film. The TMA pretreatment removed the Ga- and As-oxides more effectively than the ALD-HfO 2 process, which reduced the amount of frequency dispersion. In addition, compared to the As case, it showed more predominant suppression of both Ga out-diffusion and Ga-O bond formation, which is believed to have delayed the thermal degradation of the capacitance equivalent thickness (CET). The optimal number of TMA treatment exhibited the best thermal stability without increasing the as-deposited CET.

Original languageEnglish
Pages (from-to)G6-G10
JournalJournal of the Electrochemical Society
Volume159
Issue number1
DOIs
Publication statusPublished - 2012 Feb 29

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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